Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale
Identifieur interne : 000055 ( France/Analysis ); précédent : 000054; suivant : 000056Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale
Auteurs : Abdel-Aziz El Mel [Belgique] ; Marie Buffière [Belgique] ; Pierre-Yves Tessier [France] ; Stephanos Konstantinidis [Belgique] ; Wei Xu [États-Unis] ; Ke Du [États-Unis] ; Ishan Wathuthanthri [États-Unis] ; Chang-Hwan Choi [États-Unis] ; Carla Bittencourt [Belgique] ; Rony Snyders [Belgique]Source :
- Small [ 1613-6810 ] ; 2013-09-09.
Descripteurs français
- Wicri :
- topic : Oxyde.
English descriptors
- KwdEn :
- Acta mater, Annealing, Annealing time, Aspect ratio, Bulk diffusion, Choi, Columnar morphology, Complete oxidation, Copper ions, Copper nanowires, Copper oxide nanotubes, Critical temperature, Deep reactive, Different shapes, Fundamental mechanisms, Grain boundaries, Granular morphology, Hollow nanostructures, Hollow oxide, Hollow oxide nanostructures, Hollowing process, Kirkendall, Kirkendall effect, Laser interference lithography, Magnetron, Mater, Metal nanowires, Model system, Morphology, Nano lett, Nanodots, Nanograting structures, Nanopatterned silicon substrate, Nanoscale kirkendall effect, Nanostructures, Nanotube, Nanotube arrays, Nanowire, Nanowires, Oxidation process, Oxide, Oxide nanotubes, Oxide shell, Oxygen atoms, Oxygen ions, Oxygen species, Silicon, Silicon substrate, Surface diffusion, Surface energy, Thermal annealing, Thermal oxidation, Thermal oxidation time, Total diameter, Transmission electron microscopy, Verlag gmbh, Weak adhesion, Wire axis.
- Teeft :
- Acta mater, Annealing, Annealing time, Aspect ratio, Bulk diffusion, Choi, Columnar morphology, Complete oxidation, Copper ions, Copper nanowires, Copper oxide nanotubes, Critical temperature, Deep reactive, Different shapes, Fundamental mechanisms, Grain boundaries, Granular morphology, Hollow nanostructures, Hollow oxide, Hollow oxide nanostructures, Hollowing process, Kirkendall, Kirkendall effect, Laser interference lithography, Magnetron, Mater, Metal nanowires, Model system, Morphology, Nano lett, Nanodots, Nanograting structures, Nanopatterned silicon substrate, Nanoscale kirkendall effect, Nanostructures, Nanotube, Nanotube arrays, Nanowire, Nanowires, Oxidation process, Oxide, Oxide nanotubes, Oxide shell, Oxygen atoms, Oxygen ions, Oxygen species, Silicon, Silicon substrate, Surface diffusion, Surface energy, Thermal annealing, Thermal oxidation, Thermal oxidation time, Total diameter, Transmission electron microscopy, Verlag gmbh, Weak adhesion, Wire axis.
Abstract
Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.
Url:
DOI: 10.1002/smll.201202824
Affiliations:
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acta mater</term>
<term>Annealing</term>
<term>Annealing time</term>
<term>Aspect ratio</term>
<term>Bulk diffusion</term>
<term>Choi</term>
<term>Columnar morphology</term>
<term>Complete oxidation</term>
<term>Copper ions</term>
<term>Copper nanowires</term>
<term>Copper oxide nanotubes</term>
<term>Critical temperature</term>
<term>Deep reactive</term>
<term>Different shapes</term>
<term>Fundamental mechanisms</term>
<term>Grain boundaries</term>
<term>Granular morphology</term>
<term>Hollow nanostructures</term>
<term>Hollow oxide</term>
<term>Hollow oxide nanostructures</term>
<term>Hollowing process</term>
<term>Kirkendall</term>
<term>Kirkendall effect</term>
<term>Laser interference lithography</term>
<term>Magnetron</term>
<term>Mater</term>
<term>Metal nanowires</term>
<term>Model system</term>
<term>Morphology</term>
<term>Nano lett</term>
<term>Nanodots</term>
<term>Nanograting structures</term>
<term>Nanopatterned silicon substrate</term>
<term>Nanoscale kirkendall effect</term>
<term>Nanostructures</term>
<term>Nanotube</term>
<term>Nanotube arrays</term>
<term>Nanowire</term>
<term>Nanowires</term>
<term>Oxidation process</term>
<term>Oxide</term>
<term>Oxide nanotubes</term>
<term>Oxide shell</term>
<term>Oxygen atoms</term>
<term>Oxygen ions</term>
<term>Oxygen species</term>
<term>Silicon</term>
<term>Silicon substrate</term>
<term>Surface diffusion</term>
<term>Surface energy</term>
<term>Thermal annealing</term>
<term>Thermal oxidation</term>
<term>Thermal oxidation time</term>
<term>Total diameter</term>
<term>Transmission electron microscopy</term>
<term>Verlag gmbh</term>
<term>Weak adhesion</term>
<term>Wire axis</term>
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<keywords scheme="Teeft" xml:lang="en"><term>Acta mater</term>
<term>Annealing</term>
<term>Annealing time</term>
<term>Aspect ratio</term>
<term>Bulk diffusion</term>
<term>Choi</term>
<term>Columnar morphology</term>
<term>Complete oxidation</term>
<term>Copper ions</term>
<term>Copper nanowires</term>
<term>Copper oxide nanotubes</term>
<term>Critical temperature</term>
<term>Deep reactive</term>
<term>Different shapes</term>
<term>Fundamental mechanisms</term>
<term>Grain boundaries</term>
<term>Granular morphology</term>
<term>Hollow nanostructures</term>
<term>Hollow oxide</term>
<term>Hollow oxide nanostructures</term>
<term>Hollowing process</term>
<term>Kirkendall</term>
<term>Kirkendall effect</term>
<term>Laser interference lithography</term>
<term>Magnetron</term>
<term>Mater</term>
<term>Metal nanowires</term>
<term>Model system</term>
<term>Morphology</term>
<term>Nano lett</term>
<term>Nanodots</term>
<term>Nanograting structures</term>
<term>Nanopatterned silicon substrate</term>
<term>Nanoscale kirkendall effect</term>
<term>Nanostructures</term>
<term>Nanotube</term>
<term>Nanotube arrays</term>
<term>Nanowire</term>
<term>Nanowires</term>
<term>Oxidation process</term>
<term>Oxide</term>
<term>Oxide nanotubes</term>
<term>Oxide shell</term>
<term>Oxygen atoms</term>
<term>Oxygen ions</term>
<term>Oxygen species</term>
<term>Silicon</term>
<term>Silicon substrate</term>
<term>Surface diffusion</term>
<term>Surface energy</term>
<term>Thermal annealing</term>
<term>Thermal oxidation</term>
<term>Thermal oxidation time</term>
<term>Total diameter</term>
<term>Transmission electron microscopy</term>
<term>Verlag gmbh</term>
<term>Weak adhesion</term>
<term>Wire axis</term>
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<front><div type="abstract">Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.</div>
</front>
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<country name="France"><region name="Pays de la Loire"><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name>
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<name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name>
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<name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name>
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